Customization: | Available |
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Application: | Power Electronic Components, Semiconductor Wafer |
Batch Number: | 2023+ |
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HGTECH Wafer Cutting Series Semiconductor Wafer Processing Plant Laser Modified Cutting Equipment Mainly used for metal and silicon, germanium, gallium arsenide, and other semiconductor material substrate scribing and cutting, machinable solar panels, silicon, ceramic, aluminum foil, etc., the workpiece is fine and beautiful with smooth cutting edges.
Product advantages:
There is no damage on the surface, no cutting seam, and the edge collapse is very small (≤ 2 μ m) , the edge is small (< 3 μ m)
Multi focus modification mode can be adopted to multiply the cutting efficiency
The laser has high average power stability (≤± 3% over 24 hours) and high beam quality (M ² < 1.5)
Item |
Main parametetrs |
|
Laser |
Center wavelength |
Custom infrared wavelength |
Cutting head |
Self-developed collimating head | |
Performance |
Effective working stroke |
300x400mm(optional) |
Repetitive positioning accuracy |
±1μm |
|
Visual positioning |
Automatic visual positioning |
|
Processing method |
Layer by layer upgrading, single point / multi-point processing | |
Others |
Wafer size |
8 inch (12inch is compatible ) |
Processing process |
Laser modified cutting - film spreading | |
Processing object |
MEMS chip, silicon-based biochip, silicon wheat chip, CMOS chip, etc |
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